Premium Tantalum Particle Evaporation Material for Advanced Applications

• Customization: Available
• Application: Industrial, Electronics, Aviation
• Product Name: Tantalum Particles
• Model NO.: Tantalum Particles
• Keywords: Tantalum Metal Particles
• Material: Tantalum
• Shape: Particle
• Chemical Composition: Tantalum
• Purity: 99.95%
• Size: Customized
• Color: Metal Grey
• Standard: ASTM
• Density: 16.68g/cm3
• Package: Custom Made
• Melting Point: 3017celsius
• Boiling Point: 5458celsius
• Poisson′s Ratio: 0.34
• Young′s Modulus: 186gpa
• Transport Package: Standard Packaging or Customized
• Specification: Standard specifications or customized
• Trademark: TAIZEHUI
• Origin: Baoji, China
• HS Code: 8105201000
• Production Capacity: 5000000pieces/Year

Product Description

Product Description

The application of tantalum particles continues to expand into emerging technology fields, and their irreplaceability is particularly prominent in high-temperature, high-corrosion and high-precision scenarios.
 

The application of tantalum particles continues to expand into emerging technology fields, and their irreplaceability is particularly prominent in high-temperature, high-corrosion and high-precision scenario

TANTALUM  GRANULES SPECIFICATIONS
Product Name	TantalumParticles
Keywords	Tantalum  Metal Particles
Material	Tantalum
Shape	Particle
Chemical Composition	Tantalum
Purity	99.95%
Size	Customized
Surface	Polished
Color	Metal Grey
Standard	ASTM
Density	16.68g/cm3
Package	Custom Made
Melting Point	3017Celsius
Boiling Point	5458 Celsius
Poisson's Ratio	0.34
We support customization of Tantalum Plate of various specifications and uses

Detailed Photos

1. ELECTRONICS  AND  SEMICONDUCTOR    INDUSTRY 

Thin film deposition
Physical vapor deposition (PVD) : It is used to prepare high-purity tantalum films and serves as a barrier layer for semiconductor copper interconnections (to prevent copper diffusion).

Electron beam Evaporation (E-beam Evaporation) : Depositing a uniform tantalum film on the surface of a wafer for chip manufacturing.
Capacitor manufacturing
High specific surface area tantalum powder is used to produce tantalum electrolytic capacitors (small in size and large in capacity), which are widely applied in mobile phones, computers, automotive electronics, etc.
Sputtering target material
Tantalum particles are sintered into target materials and used for magnetron sputtering coating (such as manufacturing integrated circuits and display films).

 

FAQ

Q1. How can we ensure the quality of the product?
A1.All products will go through a strict testing process, if you need, we can provide you with a quality testing report.

Q2.Can I get a sample before I place an order?
A2.Of course! If it is a normal size and we have stock in the warehouse, we will supply a sample free of charge.

Q3. What property makes hafnium ideal for high-temperature applications?
A3. Its high melting point makes it ideal for such applications. It actually can withstand up to 2200°C without losing strength.

Q4. Are hafnium alloys corrosion-resistant?
A4. Yes. Their corrosion-resistant properties have made people in the industry use them in extreme environments like aerospace and chemical industries.

Q5. What is the impact of hafnium on the semiconductor industry?
A5. The addition of hafnium in thin films is a game changer. It enhances the dielectric constant hence improving the performance of advanced semiconductor devices.

Q6. How does hafnium compare with tungsten in aerospace?
A6. Both metals have a sturdy build, making them ideal for high-stress applications. However, a combination of tungsten and hafnium creates resistive ignition for better efficacy.